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SME:Zhou Haiping

published: 2016-12-27 14:27:34       hits: 

name : Zhou Haiping  Sex: M phone: 028-83202556
email: haipzhou@uestc.edu.cn office-address: No.2006,Xiyuan Ave. West Hi-Tech. Zone, Chengdu, Sichuan Province, China
No.4, Section 2, North Jianshe Road, Chenghua District
Chengdu, Sichuan Province,China
PH.D  Supervisor: No Master Supervisor: Yes 或No
major: Electronic Science and Technology
research interst: Electronic Thin Film Integrated Devices Technology
Biography: Dr. Zhou Haiping joined UESTC at 2013 after finishing his PhD degree at NTU, Singapore. His research scope includes plasma science and technology, renewable energy materials and devices. 
Education experience: 2009-2013, Nanyang Technological University, Singapore,PhD;2002-2005, Shanghai Jiao Tong Univeristy, China, MS.
Selected Publications: 1. A comparative study on the direct deposition of μc-Si:H and plasma-induced recrystallization of a-Si:H: Insight into Si crystallization in a high-density plasma, H.P. Zhou*, M. Xu, S. Xu, Y.Y. Feng, L.X. Xu, D.Y. Wei and S.Q. Xiao, Applied Surface Science 433, 285 (2018)
2. Rapid and Controllable a-Si:H-to-nc-Si:H Transition Induced by a High-density Plasma Route, H.P. Zhou*, M. Xu*, S. Xu, L.X. Xu, H. Ji, S. Q. Xiao, and Y. Y. Feng, J. Phys. D: Appl. Phys. 50, 385103 (2017).
3. Radicals and ions controlling by adjusting the antenna-substrate distance in a-Si:H deposition using a planar ICP for c-Si surface passivation, H.P. Zhou*, S. Xu, M. Xu, L.X. Xu, D.Y. Wei, Y. Xiang and S.Q. Xiao, Applied Surface Science 396, 926 (2016).
4. Hydrogen-plasma-induced Rapid, Low-Temperature Crystallization of μm-thick a-Si:H Films, H. P. Zhou, M. Xu, S. Xu, Liu, C. X. Liu, L. C. Kwek, and L. X. Xu, Scientific Reports, 6, 32716; doi: 10.1038/srep32716 (2016).
Books: 1.S. Q. Xiao, S. Xu and H. P. Zhou, Chapter 12 “Plasma Technology in Silicon Photovoltaics” in Book “Low Temperature Plasma Technology Methods and Applications” (ISBN 9781466509900 - CAT# K14746) Taylor & Francis Group, CRC Press, 15 July, 2013
2.H. P. Zhou, S. Xu and S. Q. Xiao, chapter “High-density plasma enhanced chemical vapor deposition of Si-based materials for solar cell applications” in “Chemical Vapor Deposition-Recent advances and applications in optical, solar cells and solid state devices”, Intech (ISBN 978-953-51-4733-6), Aug. 2016.